This guide applies to the OSCG system design used for the generation of chemicals, particularly ultra high purity, used in the silicon wafer, integrated circuit, and/or substrate manufacturing processes. These will include, but are not limited to, various concentrations of NH4OH, HCl, HF, and NH4F aqueous solutions.

This standard does not purport to address all of the safety issues associated with its use. It is the responsibility of the users of this standard to establish appropriate safety and health practices and determine the applicablity of regulatory limitations prior to use.

Purpose

This guide establishes the min imum System and Overall Implementation requirements for requirement of On-Site Chemical Generation (OSCG) used in semiconductor manufacturing. It is also intended to establish a common basis for developing detailed guides in subsequent documents concerning design, performance, and certification of OSCG systems.