| 1. |
. |
ARMY A-A-59543 CANC NOTICE 1 |
|
|
2005-FEB-14 • 已取消 •
SCREEN, HALFTONE, CONTACT, FOR PHOTOLITHOGRAPHY
|
|
| 2. |
. |
ARMY ARMY TM 5-245 |
|
|
1970-JUL-01 • 现用 •
OFFSET PHOTOLITHOGRAPHY AND MAP REPRODUCTION
|
|
| 3. |
. |
GOST R 8.640 |
|
|
2008-JAN-01 • 现用 •
State system for ensuring the uniformity of measurements. Radiometers of ultraviolet radiation measurements for photolithography technological processes testing. Verification methods
|
|
| 4. |
. |
ARMY MIL-S-40034B CANC NOTICE 1 |
|
|
2000-MAY-22 • 已取消 •
SCREENS, HALFTONE, CONTACT, FOR PHOTOLITHOGRAPHY
|
|
| 5. |
. |
DS DS/EN 62047-2 |
|
|
2006-DEC-19 • 现用 •
Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin film materials
|
|
| 6. |
. |
DS DS/EN ISO 11553-1 |
|
|
2009-JAN-14 • 现用 •
Safety of machinery - Laser processing machines - Part 1: General safety requirements
|
|
| 7. |
. |
DS DSF/FprEN 62047-6 |
|
|
Date NA • 待定/草稿 •
Semiconductor devices - Micro-electromechanical devices -- Part 6: Axial fatigue testing methods of thin film materials
|
|
| 8. |
. |
DS DSF/prEN 62047-6 |
|
|
Date NA • INAC-DOBS •
Semiconductor devices - Micro-electromechanical devices -- Part 6: Axial fatigue testing methods of thin film materials
|
|
| 9. |
. |
DS DSF/prEN ISO 11553-1 |
|
|
Date NA • 待定/草稿 •
Safety of machinery - Laser processing machines - Part 1: General safety requirements (ISO 11553-1:2005)
|
|
| 10. |
. |
IEC 62047-2 |
|
|
2006-AUG-01 • 现用 •
Semiconductor devices – Micro-electromechanical devices – Part 2: Tensile testing method of thin film materials-Edition 1.0
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